Abstract of Heteroepitaxy of SrTiO3 thin films on Si (001) using different growth strategies: Toward substratelike quality   Heteroepitaxy of SrTiO3 thin films on Si (001) using different growth strategies: Toward substratelike quality NIU G. , VILQUIN B., PENUELAS J., BOTELLA C., HOLLINGER G., SAINT-GIRONS G., , , , , , , , , , , , , , Recent Research Developments in Applied Physics 29, (4) (2011) Different molecular beam epitaxy (MBE) strategies for fabricating SrTiO3(STO) thin films on Si (001) substrates are described and compared. The resulting STO structural quality (crystallinity, surface roughness, and interface sharpness) is systematically analyzed depending on growth conditions. In particular, the authors show that sharp STO/Si interface and good STO structural quality can be obtained up to the plastic relaxation critical thickness by using direct STO epitaxy in a narrow (low temperature and low oxygen partial pressure)